"photoresist" AND lithographyの研究動向・論文数推移・被引用分析（2026-05-01時点）
※本記事のデータは2026-05-01時点のOpenAlex APIデータを基に集計しています。
"photoresist" AND lithographyの論文数は過去10年間で年平均+7.03%で増加しています。
本記事では、論文件数の推移と被引用上位20論文の傾向を整理します。
論文数推移（過去10年）
被引用数上位20論文（海外）
- SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography（出版年:2007, 被引用数:801, 出版社:Journal of Micromechanics and Microengineering）
https://doi.org/https://doi.org/10.1088/0960-1317/17/6/r01 - Negative photoresists for optical lithography（出版年:1997, 被引用数:337, 出版社:IBM Journal of Research and Development）
https://doi.org/https://doi.org/10.1147/rd.411.0081 - Two-photon lithography of nanorods in SU-8 photoresist（出版年:2005, 被引用数:307, 出版社:Nanotechnology）
https://doi.org/https://doi.org/10.1088/0957-4484/16/6/039 - Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist（出版年:2010, 被引用数:216, 出版社:ACS Nano）
https://doi.org/https://doi.org/10.1021/nn100686v - Trends in photoresist materials for extreme ultraviolet lithography: A review（出版年:2023, 被引用数:175, 出版社:Materials Today）
https://doi.org/https://doi.org/10.1016/j.mattod.2023.05.027 - Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance（出版年:1998, 被引用数:163, 出版社:Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena）
https://doi.org/https://doi.org/10.1116/1.590392 - Beyond EUV lithography: a comparative study of efficient photoresists' performance（出版年:2015, 被引用数:144, 出版社:Scientific Reports）
https://doi.org/https://doi.org/10.1038/srep09235 - Use of SU-8 photoresist for very high aspect ratio x-ray lithography（出版年:2000, 被引用数:131, 出版社:Microelectronic Engineering）
https://doi.org/https://doi.org/10.1016/s0167-9317(00)00363-4 - Holographic lithography of periodic two- and three-dimensional microstructures in photoresist SU-8（出版年:2006, 被引用数:117, 出版社:Optics Express）
https://doi.org/https://doi.org/10.1364/oe.14.007943 - A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol–Ene System（出版年:2011, 被引用数:105, 出版社:Advanced Functional Materials）
https://doi.org/https://doi.org/10.1002/adfm.201100692 - Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning（出版年:2010, 被引用数:99, 出版社:ACS Nano）
https://doi.org/https://doi.org/10.1021/nn101212q - Fast prototyping using a dry film photoresist: microfabrication of soft-lithography masters for microfluidic structures（出版年:2007, 被引用数:97, 出版社:Journal of Micromechanics and Microengineering）
https://doi.org/https://doi.org/10.1088/0960-1317/17/10/n01 - Recent developments in photoresists for extreme-ultraviolet lithography（出版年:2023, 被引用数:89, 出版社:Polymer）
https://doi.org/https://doi.org/10.1016/j.polymer.2023.126020 - Organometallic and coordinative photoresist materials for EUV lithography and related photolytic mechanisms（出版年:2023, 被引用数:88, 出版社:Coordination Chemistry Reviews）
https://doi.org/https://doi.org/10.1016/j.ccr.2023.215307 - Molecular glass photoresists for advanced lithography（出版年:2006, 被引用数:82, 出版社:Journal of Materials Chemistry）
https://doi.org/https://doi.org/10.1039/b514146j - Holographic lithography with thick photoresist（出版年:1983, 被引用数:75, 出版社:Applied Physics Letters）
https://doi.org/https://doi.org/10.1063/1.94533 - Nonlinear optical properties of photoresists for projection lithography（出版年:1996, 被引用数:74, 出版社:Applied Physics Letters）
https://doi.org/https://doi.org/10.1063/1.116411 - Photoresists for 193-nm lithography（出版年:1997, 被引用数:67, 出版社:IBM Journal of Research and Development）
https://doi.org/https://doi.org/10.1147/rd.411.0095 - Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting（出版年:2019, 被引用数:66, 出版社:Micromachines）
https://doi.org/https://doi.org/10.3390/mi10030192 - Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography（出版年:2011, 被引用数:64, 出版社:Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE）
https://doi.org/https://doi.org/10.1117/12.879385
